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2nd Workshop on Sequential Infiltration Synthesis (SIS)
December 14th-15th, 2020

Upon the successful 1st edition of the SIS thematic workshop that was organized last year in Milan, we are pleased to announce the 2nd Workshop on Sequential Infiltration Synthesis that will be held online. The workshop will include two half days of talks and discussions from 3 pm to 6 pm (Rome time).


Sequential infiltration synthesis (SIS) has emerged as a viable preparation route for hybrid inorganic/organic materials, by penetration of gaseous metal precursors into polymer films, fibers, foams, or biomaterials. The incorporation of inorganic materials into organic matrices offers the possibility to enhance the functional properties of the final composite (i.e. mechanical strength, chemical etch resistance, optical properties, etc.). Typical SIS process consists of a controlled sequence of metal-organic precursor and coreactant vapor exposures of the organic samples in an atomic layer deposition (ALD) reactor.

In particular, infiltration in lithographically patterned polymeric thin films or in self-assembled or directed self-assembled (DSA) block copolymer (BCP) films allows the formation of inorganic nanostructures, once the polymer matrix is removed by a plasma or annealing step. Simply replicating the patterned polymer or BCP templates, metal oxide (Al2O3, TiO2, SiO2, or ZnO) and metal (W) nanoarchitectures have been directly fabricated, for applications as sub-20 nm enhanced lithographic masks or as active elements in advanced nanoscale electronic devices.

This workshop will focus on the challenges related to potential applications of SIS as well as to understanding of fundamental mechanisms. It will offer an event dedicated to present, discuss, exchange knowledge, and getting informed about the most recent developments. The intersection of different communities interested in SIS, originated either from research on atomic layer deposition (ALD) or on advanced lithography, evidences the need of an event to bring together and to contaminate the different approaches to this topic. It will provide an opportunity for meeting, exchanging ideas, and designing new paths for collaborative research.


Topics of interest for the workshop will include:

Official Program

Abstract list

Invited Speakers


Vapor Phase Infiltration for Structure-Property Correlation in Organic Solar Cell Blends

Prof. Gitti Frey - Technion- Israel Institute of Technology

Vapor Phase Infiltration to Hybridize Thin films of Electron Beam and Nanoimprint Resists

Prof. Masaru Nakagawa & Prof. Shunya Ito - Tohoku University

Recent Advances in SIS for Water Remediation

Dr. Seth Darling - Argonne National Laboratory

The Thermodynamics and Kinetics of Vapor Phase Infiltration of Polymers: Considerations for Collecting and Reporting Experimental Measurements

Prof. Mark Losego – Georgia Tech

Abstract Submission

Abstracts should be submitted as *.pdf-file of sufficient print quality in a 2-page format, with the first page text (< 250 words) and the second page accompanying tables and figures. Font size should be at least 11. Affiliation, address and email of the corresponding author should be included, as well as your preference for oral or poster presentation. The abstract will be thoroughly reviewed by the program committee. The submission deadline is Friday, November 21st, 2020.

Conference Registration

The workshop will be online using dedicated platform for webinars and no conference fee will be charged to attend the conference.

Important Deadlines

Organizing Committee


If you need more information about SIS2020 don't hesitate to contact us: